Stripper remove unnecessary the layer of photoresist. After the photolithography process in semiconductor manufacturing process.
Etchant is used to removes materials from a specific area by chemical reaction and is used a material in the etching process of the photolithography process.
Functional cleaners are used in the process of exposed fine metal circuity and have a good performance for removing organic residues and particles effectively.
CMP Slurry used to flatten and polish semiconductor layers by chemical after forming each layers.
Item | Feature |
---|---|
Ceria Slurry | High Selectivity Slurry |
Ceria Slurry HPS/SCP | HPS Slurry |
Auto-Stopping Slurry | |
Silica Slurry Metal | W Slurry | IMD Slurry |
Normal Slurry | TSV Slurry |
Stripper remove unnecessary the layer of photoresist. After the photolithography process in display manufacturing process.
Etchant is used on the metal etching process in which metal parts are etched according to the photoresist patterns through a chemical reaction to form the electric circuit.
Functional cleaners are used in the process of exposed fine metal circuity and have a good performance for removing organic residues and particles effectively.
We have a good network in Korea, China, Indonesia, Japan and India for semiconductor, display chemical field
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